Download Molecular Theory of Lithography by Uzodinma Okoroanyanwu PDF
By Uzodinma Okoroanyanwu
This ebook is a unified exposition of the molecular concept that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions taken with lithographic imaging. It additionally offers the theoretical foundation for the most unit operations of the complicated lithographic procedure, in addition to for complex lithographic imaging mechanisms, together with photochemical and radiochemical, imprint, and directed block copolymer self-assembly imaging mechanisms. The booklet is meant for scholar and execs whose wisdom of lithography extends to the chemistry and physics underlying its quite a few kinds. A familiarity with chemical kinetics, thermodynamics, statistical mechanics, and quantum mechanics may be worthy, as might be familiarity with undemanding strategies in physics corresponding to power, strength, electrostatics, electrodynamics, and optics.
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67, 3114–3116 (1995). 42. G. M. Whitesides and J. C. Love, “The art of building small,” Scientific American Reports 17(3), 13–21 (2007). 2 Photoimprint lithography Photoimprint lithography (PIL) involves the application of liquid photocurable oligomers, crosslinkers, radical initiators, and other small molecules instead of a thermoplastic polymer (as in TIL) to the substrate, following which a transparent mold (often made of quartz or fused silica) is impressed upon the above mixture formulation, with enough pressure (2000 mPas maximum) at room temperature and for time duration long enough for the resist to flow and fill the cavities in the mold, following which the now imprinted liquid resist film is photocured and solidified with light of appropriate wavelength.
S. Bates and G. H. Fredrickson, “Block copolymer thermodynamics: Theory and experiment,” Ann. Rev. Phys. Chem. 41, 525 (1990). 70. E. L. Thomas and R. L. Lescanec, “Phase morphology in block copolymer systems,” Philos. Trans. R. Soc. London Ser. A 348, 149–166 (1994). 71. A random copolymer is one in which the constituent monomers of the polymer occur randomly in the polymer chain, and not in blocks of similar units. 15 Approaches to lithographically directed block copolymer (BCP) self-assembly.
Deviations occurring at both the high and low ends are consequential: insufficient priming can lead to adhesion failure, while overpriming can lead to dewetting. Priming can also impact the development time in wet processes. In conditions of high fluence exposure such as in DUV hardening that occurs before ion implantation, overpriming can also lead to a phenomenon known as “popping,” in which nitrogen formed in the diazonaphthoquinone/novolac type resists may not escape from the film quickly enough through diffusion, but may instead accumulate at the resist/wafer interface, weakening the adhesion between the two surfaces, and resulting in the formation of bubbles there.